BYU Home page BRIGHAM YOUNG UNIVERSITY  
Search BYU 
Contact   |   Help
Navigation Menu

Cleanroom Home
Photonics Home
Semiconductor Properties...
Microfabrication Processes...
Optical References...
Metrology...
Cleanroom Equipment...
Safety and Protocol...
Personnel and Links...



MOSFET Calculator

Background Info

Show / Hide

Images taken from "Semiconductor Devices: Physics and Technology" 2nd Ed., S.M. Sze


Gate Oxide Thickness (tox): Å Oxide Capacitance (Cox): F/cm2
Channel Length (L): um
Channel Width (Z): um
Mobility (μ): cm2/V•s
Gate Voltage Range(VG): V to V      Step Size: V
Drain Voltage Range(VD): V to V
Channel Doping (NB): 1/cm3

Treshold Voltage (VT): V
Maintained by ECEn Dept. Web Team.
Copyright © 1994-2004. Brigham Young University. All Rights Reserved.